ANTI/Foam CR-D is a non-silicon foam control agent formulated to inhibit foaming associated with photopolymer developing and stripping. ANTI/Foam CR-D disperses extremely quickly in aqueous applications for improved antifoam performance.
Performance Features
ANTI/Foam CR-D does not contain silica, fumed silica, or silicone.
ANTI/Foam CR-D can be employed in both developing and resist stripping applications.
ANTI/Foam CR-D is compatible with nearly all types of plastics and elastomers.
ANTI/Foam CR-D is free rinsing virtually eliminating residue on process equipment.
RE/Gen CC-40 is a concentrated, stabilized, and buffered sodium chlorate solution designed to economically and safely regenerate cupric chloride etching systems.
ENVIRO/Strip Cu is an economical, single step, hydrogen peroxide/bifluoride based tin and tin-lead stripping solution designed specifically for spray applications.
