ANTI/Foam CR-98S

Product Code

0005551

Product Description

ANTI/Foam CR-98S is an organic defoamer used to eliminate foam that develops in spray chambers for the developing and stripping of photoresist. The gradual dissolving of resist into developing and stripping solutions causes the generation of foam from the agitation of the spray pressure that can cause the sumps to foam over or even shut down the operation of the machine by a control interlock.

Performance Features

CR-98S leaves a clean copper surface.
CR-98S is chemically stable in alkaline solutions.
CR-98S is extremely free-rinsing virtually eliminating residue on process equipment.
CR-98S does not attack photo resist.
CR-98S can be employed in both developing and resist stripping applications.

Technical Data Sheet (TDS)

Product Categories

Industrial Cleaning, Printed Circuit Board

Develop Etch Strip (Inner Layer), Parts Cleaning, Soldermask, Strip Etch Strip (Outer Layer)

Antifoams, Silicated Defoamers

CONTACT US

More Products

Seacole PA Liquid Deicer

Seacole PA Liquid Deicer is a potassium acetate deicing agent that is an alternative to standard pelleted ice melt. Safe for use near grass and landscaping.

Film Cleaner 101

Film Cleaner 101 removes oil, grease, dust, and fingerprints from all types of film including Diazo Emulsion Imaging films. Film Cleaner 101 is formulated with an anti-static agent for removing static from nonconductive films.

POLY/Solv RS-50

POLY/Solv RS-50 is a concentrated solution designed to economically and efficiently strip all commercially available, fully aqueous dry film resists.