Film Cleaner 101
Film Cleaner 101 removes oil, grease, dust, and fingerprints from all types of film including Diazo Emulsion Imaging films. Film Cleaner 101 is formulated with an anti-static agent for removing static from nonconductive films.
Film Cleaner 101 removes oil, grease, dust, and fingerprints from all types of film including Diazo Emulsion Imaging films. Film Cleaner 101 is formulated with an anti-static agent for removing static from nonconductive films.
PC 450C is a carbonate based, liquid developer concentrate for developing fully or semi aqueous dry films and/or liquid photo imagable solder masks.
PC-750 is a carbonate based, liquid developer concentrate for developing fully or semi aqueous dry films and/or liquid photo imagable solder masks.
PC 450 is a carbonate based, liquid developer concentrate for developing fully or semi aqueous dry films and/or liquid photo imagable solder masks.
RE/Gen CC-40 is a concentrated, stabilized, and buffered sodium chlorate solution designed to economically and safely regenerate cupric chloride etching systems.
RE/Gen CC-45 is a concentrated, buffered sodium chlorate solution designed to economically and safely regenerate cupric chloride etching systems.
POLY/Solv RS-40 is a concentrated, monothanolamine based solution designed to economically and efficiently strip all commercially available, fully aqueous dry film resists.
POLY/Solv RS-50 is a concentrated solution designed to economically and efficiently strip all commercially available, fully aqueous dry film resists.
POLY/Solv RS-70 is a highly concentrated solution designed to economically and efficiently strip most of the commercially available, fully aqueous dry film resists.
POLY/Solv RS-720 (RS-720) is a highly concentrated solution designed to economically and efficiently strip most commercially available, fully aqueous dry film resists.
POLY/Solv RS-740 is a highly concentrated solution designed to economically and efficiently strip most commercially available, fully aqueous dry film resists.
ANTI/Foam CR-98 is a non-silicon, non-solvent based anti-foam designed to be used in conveyorized spray equipment when developing and stripping aqueous processable dry film and LPISM.
ANTI/Foam CR-98S is an organic defoamer used to eliminate foam that develops in spray chambers for the developing and stripping of photoresist.
ANTI/Foam CR-99 is a non-silicon, non-solvent based anti-foam designed to be used in conveyorized spray equipment when developing and stripping aqueous processable dry film and LPISM.
ANTI/Foam CR-D is a non-silicon foam control agent formulated to inhibit foaming associated with photopolymer developing and stripping.
EQUIPMENT/Cleaner 20 is a highly concentrated detergent designed specifically to remove chemical scale, hard water scale, dry film and LPISM residue, and anti-foam residue from automated developing and resist stripping equipment.
EQUIPMENT/Cleaner 60 is a concentrated acid cleaner designed for use in developers, resist strippers and other processing tanks.
EQUIPMENT/Cleaner 70 is a concentrated acid cleaner designed for use in developers, resist strippers and other processing tanks.
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