PC-450C
PC 450C is a carbonate based, liquid developer concentrate for developing fully or semi aqueous dry films and/or liquid photo imagable solder masks.
PC 450C is a carbonate based, liquid developer concentrate for developing fully or semi aqueous dry films and/or liquid photo imagable solder masks.
PC-750 is a carbonate based, liquid developer concentrate for developing fully or semi aqueous dry films and/or liquid photo imagable solder masks.
PC 450 is a carbonate based, liquid developer concentrate for developing fully or semi aqueous dry films and/or liquid photo imagable solder masks.
RE/Gen CC-40 is a concentrated, stabilized, and buffered sodium chlorate solution designed to economically and safely regenerate cupric chloride etching systems.
RE/Gen CC-45 is a concentrated, buffered sodium chlorate solution designed to economically and safely regenerate cupric chloride etching systems.
POLY/Solv RS-40 is a concentrated, monothanolamine based solution designed to economically and efficiently strip all commercially available, fully aqueous dry film resists.
POLY/Solv RS-50 is a concentrated solution designed to economically and efficiently strip all commercially available, fully aqueous dry film resists.
ANTI/Foam CR-98 is a non-silicon, non-solvent based anti-foam designed to be used in conveyorized spray equipment when developing and stripping aqueous processable dry film and LPISM.
POLY/Solv RS-70 is a highly concentrated solution designed to economically and efficiently strip most of the commercially available, fully aqueous dry film resists.
POLY/Solv RS-720 (RS-720) is a highly concentrated solution designed to economically and efficiently strip most commercially available, fully aqueous dry film resists.
POLY/Solv RS-740 is a highly concentrated solution designed to economically and efficiently strip most commercially available, fully aqueous dry film resists.
ANTI/Foam CR-98S is an organic defoamer used to eliminate foam that develops in spray chambers for the developing and stripping of photoresist.
ANTI/Foam CR-99 is a non-silicon, non-solvent based anti-foam designed to be used in conveyorized spray equipment when developing and stripping aqueous processable dry film and LPISM.
ANTI/Foam CR-D is a non-silicon foam control agent formulated to inhibit foaming associated with photopolymer developing and stripping.
EQUIPMENT/Cleaner 20 is a highly concentrated detergent designed specifically to remove chemical scale, hard water scale, dry film and LPISM residue, and anti-foam residue from automated developing and resist stripping equipment.
EQUIPMENT/Cleaner 60 is a concentrated acid cleaner designed for use in developers, resist strippers and other processing tanks.
EQUIPMENT/Cleaner 70 is a concentrated acid cleaner designed for use in developers, resist strippers and other processing tanks.
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